FluoroPOSS Monolayers Covalently Bound to a Silica Surface

Abstract

Recent studies have been increasingly utilizing fluoroalkyl-substituted Polyhedral Oligomeric SilSesquioxanes (POSS) molecules, known as fluoroPOSS, for producing non-wetting surfaces. Most commonly, (1H,1H,2H,2H-perfluorodecyl)8Si9O12 (fluorodecyl POSS, has been utilized for its extraordinarily low surface energy (=10 mN/m) and phase behavior in polymer blends. However, fluoroPOSS surfaces can seldom experience abrasion, or extended exposure to certain liquids, and still retain their non-wetting properties. A route to synthesize a functional fluoroPOSS molecule or monomer, with the ability to be covalently attached to a textured surface or polymer, is desired for the potential ability to develop a mechanically robust omniphobic surface. In the current study, mono-, di-, and tri-chlorosilanes tethered to a fluorodecyl POSS cage are synthesized via hydrosilylation of (vinyl, methyl) (1H,1H,2H,2H-perfluorodecyl)8Si9O13 POSS. Products are identified by NMR spectrometry. The synthesized monochlorosilyl-functional fluoroPOSS compound is subsequently used to treat silicon dioxide surfaces. Covalent attachment is confirmed by atomic force microscopy and dynamic contact angle analysis.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Oct 21, 2010
Accession Number
ADA533421

Entities

People

  • Joseph M Mabry
  • Raymond Campos
  • Sean M. Ramirez
  • Timothy S. Haddad

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Abrasion
  • Air Force
  • Air Force Research Laboratories
  • Attachment
  • Dioxides
  • Elements
  • Energy
  • Microscopy
  • Military Research
  • Mixtures
  • Molecules
  • Monomolecular Films
  • Silicon
  • Silicon Compounds
  • Silicon Dioxide
  • Spectrometry
  • Surface Energy

Fields of Study

  • Materials science

Readers

  • Polymer Science and Technology
  • Surface Coatings Technology.