Surface Chemistry and Tribology of Copper Surfaces in Carbon Dioxide and Water Vapor Environments

Abstract

By combining several in situ techniques, the surface chemistry of Cu and its related oxide surfaces have been systematically investigated under ambient and aqueous conditions. Using the state-of-the-art ambient pressure X-ray spectroscopy (AP-XPS), we have revealed that metallic copper, cuprous oxide (Cu20) and cupric oxide (CuO) exhibit strikingly different behaviors with regard to water (H20) and carbon dioxide (C02) adsorption in the presence of 0.5 Torr of gases. A novel in situ liquid X-ray absorption spectroscopic technique (XAS) has been developed to real time monitor the corrosion processes of Cu films in bicarbonate solution.

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Document Details

Document Type
Technical Report
Publication Date
Feb 23, 2011
Accession Number
ADA538801

Entities

People

  • Miquel B. Salmerón

Organizations

  • University of California, Berkeley

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption
  • Carbon Dioxide
  • Chemical Compounds
  • Chemistry
  • Department Of Defense
  • Electrochemical Cells
  • Engineering
  • Environment
  • Films
  • Quartz Crystal Microbalances
  • Spectra
  • Spectroscopy
  • Surface Chemistry
  • Tribology
  • Vapors
  • Water Vapor
  • X Rays

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Thin Film Deposition Science.