Ion Source Development for a Compact Proton Beam Writing System
Abstract
This is the final report of the first phase of a project to overcome the diffraction constraints of traditional optical lithography to utilize ion beam technologies to produce sub-100 nm features.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 15, 2011
- Accession Number
- ADA548277
Entities
People
- C. W. Hagen
- F. Watt
- J. A. Van Kan
- T. Osipowicz
Organizations
- National University of Singapore