Epitaxial Growths of m-Plane AlGaN/GaN and AlInN/GaN Heterostructures Applicable for Normally-Off Mode High Power Field Effect Transistors on Freestanding GaN Substrates
Abstract
Non-polar m-plane AlxGa1-xN and Al1-xInxN alloy films and heterostructures were grown by metalorganic vapor phase epitaxy (MOVPE) in order to obtain fundamental understandings on the growth of m-plane nitrides and carrier transport mechanisms. These alloys are being investigated for potential use in normally-off heterojunction field effect transistors (HFETs).
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 17, 2011
- Accession Number
- ADA548346
Entities
People
- Kouji Hazu
- Shigefusa Chichibu
Organizations
- Tohoku University