Antimonide-based pN Terahertz Mixer Diodes
Abstract
High frequency pN heterojunction diodes with cutoff frequencies over 1 THz have been fabricated using narrow bandgap high-mobility semiconductors. The pN heterojunction is composed of a 30 nm thick p-type In0.27Ga0.73Sb alloy and a 130 nm thick In0.69Al0.31As0.41Sb0.59 n-layer. A high-mobility n-type InAs0.66Sb0.34 contact layer is used to connect the mesa diode to a metal Ohmic contact. These alloys have a lattice constant a0=6.2 Angstroms and are grown on semi-insulating GaAs, a0=5.65 Angstroms, using a buffer consisting of 1 micron of In0.21Ga0.19Al0.6Sb with a0=6.2 Angstroms and 0.5 micron of Ga0.35Al0.65Sb with a0=6.12 Angstroms.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 2011
- Accession Number
- ADA554818
Entities
People
- Doewon Park
- H. S. Newman
- J. G. Champlain
- Richard Magno
Organizations
- United States Naval Research Laboratory