Fabrication and Characterization of Compact Silicon Oxynitride Waveguides on Silicon Chips

Abstract

We investigate silicon oxynitride (SiON) waveguides for long optical delay lines on a silicon chip. With the choice of a moderately low refractive index contrast, a balance can be achieved between compact waveguide cross-section and low loss. The material composition and refractive index are characterized by Rutherford backscattering spectrometry and ellipsometry. High-temperature annealing is performed after waveguide fabrication so as to simultaneously remove light absorbing bonds in the materials and smooth the sidewall roughness at the core?cladding interface. A meter-long SiON waveguide is demonstrated on a centimeter scale chip.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2012
Accession Number
ADA568752

Entities

People

  • Jun Zhi Tan
  • Leszek Wielunski
  • Lianghong Yin
  • Ming Lu
  • Wei Jiang
  • Weiwei Song
  • Yicheng Lu

Organizations

  • Rutgers School of Engineering

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Advanced Materials
  • Annealing
  • Ceramic Materials
  • Delay Lines
  • Electron Beam Lithography
  • Fabrication
  • Films
  • High Temperature
  • Lithography
  • Materials
  • Phased Arrays
  • Photonic Devices
  • Refractive Index
  • Roughness
  • Scattering
  • Very Large Scale Integration
  • Waveguides

Fields of Study

  • Physics

Readers

  • Microwave Engineering.
  • Nanofabrication and Microfabrication.
  • Thin Film Deposition Science.