Microfabricated Amorphous Silicon Nanopillars on an Ultrasmooth 500-nm-thick Titanium Adhesion Layer

Abstract

Amorphous silicon (Si) nanopillars are fabricated using electron beam lithography for a liftoff process. The nanopillars are fabricated on an ultrasmooth, 6.5-nm root mean square (RMS) roughness, 500-nm-thick titanium (Ti) layer using electron beam evaporation. Pillars ranging from 100‒1000 nm in diameter and approximately 200 nm in height are fabricated. Atomic force microscopy (AFM) and scanning electron microscope (SEM) images, including those collected by focused ion beam (FIB) milling, are presented to analyze the shape of the pillars and roughness of the Ti film. The smoother the Ti/Si interface, the more robust the adhesion of Si to Ti becomes.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 2012
Accession Number
ADA569548

Entities

People

  • Collin R. Becker
  • Cynthia A. Lundgren
  • Jonathan P. Ligda
  • Kenneth E Strawhecker

Organizations

  • United States Army Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Adhesion
  • Diameters
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopes
  • Electron Microscopy
  • Electrons
  • Evaporation
  • Ion Beams
  • Lithography
  • Microscopes
  • Microscopy
  • Military Research
  • Raman Spectra
  • Scanning Electron Microscopes
  • Scanning Electron Microscopy
  • Titanium

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene