Smart 45nm Foundry CMOS with Mask-Lite (trademark) Reduced Mask Costs

Abstract

American Semiconductor has created Mask-Lite which is a layout and fabrication strategy that reduces mask costs and improves access to advanced 45nm bulk CMOS from their ITAR registered and TRUSTED ready on-shore commercial foundry.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 2011
Accession Number
ADA573574

Entities

People

  • Dale G. Wilson
  • Douglas R. Hackler Sr.
  • Kenneth Hebert
  • Richard L. Chaney

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Abstracts
  • Air Force
  • Air Force Research Laboratories
  • Cost Reductions
  • Costs
  • Electronics
  • Fabrication
  • Information Operations
  • Leading Edges
  • Manufacturing
  • Military Research
  • Photolithography
  • Semiconductor Manufacturing
  • Semiconductors
  • Solid State Electronics
  • Standards

Readers

  • Energy Conservation and Renewable Energy Engineering.
  • Government and Public Administration Law.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene