Fabrication Development for Nanowire GHz-Counting-Rate Single-Photon Detectors

Abstract

We have developed a fabrication process for GHz-counting-rate, single-photon, high-detection-efficiency NbN, nanowire detectors. We have demonstrated two processes for the device patterning, one based on the standard polymethylmethacrylate (PMMA) organic positive-tone electron-beam resist and the other based on the newer hydrogen silsesquioxane (HSQ) negative-tone spin-on-glass resist. The HSQ-based process is simple and robust, providing high resolution and the prospect of high fill-factors. Initial testing results show superconductivity in the films, and suggest that the devices exhibit photosensitivity.

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 2005
Accession Number
ADA574649

Entities

People

  • Aaron B. Pearlman
  • Aleksandr Verevkin
  • Antonin Ferri
  • Boris Voronov
  • Eric Dauler
  • Gregory Gol'tsman
  • Joel K. Yang
  • Karl K Berggren
  • Roman Sobolewski
  • William E. Keicher

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Communication Systems
  • Detection
  • Detectors
  • Efficiency
  • Electron Beam Lithography
  • Electron Beams
  • Electrons
  • Fabrication
  • Films
  • High Resolution
  • Materials
  • Nanowires
  • Resistance
  • Standards
  • Superconductivity
  • Test Methods

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene