High Al-content AlGaN Alloys for Deep UV Laser Applications
Abstract
The work explores the potential of AlN as an active material for deep UV optoelectronics device applications and to address doping issues in AlN and Al-rich AlGaN.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 08, 2012
- Accession Number
- ADA578665
Entities
People
- Hongxing Jiang
- Jingyu Lin
Organizations
- Texas Tech University