Magnetron Sputtering System for Novel Intrinsically Switchable Thin Film Ferroelectric Resonators and Filters
Abstract
The RF magnetron sputtering system shown in Fig. 1 has been sponsored by the Department of Defense through the Army Research Office for the fabrication of novel intrinsically switchable thin film ferroelectric resonators and filters. The system is located in a UV light filtered cleanroom environment and is dedicated to the deposition of ferroelectric BaxSr(1-x)TiO3 thin films. It has been designed for high temperature, high deposition rate, and high uniformity thin film growth and can accommodate wafers up to 4 in diameter. This new system will enable the design and fabrication of fully integrated BST based circuits and systems. It has been assembled from parts that were purchased from various vendors which are listed in the appendix.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 03, 2012
- Accession Number
- ADA580741
Entities
People
- Amir Mortazawi
- Victor Lee
Organizations
- University of Michigan