Effect of Atomic Layer Deposition on the Quality Factor of Silicon Nanobeam Cavities

Abstract

In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 +/- 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

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Document Details

Document Type
Technical Report
Publication Date
Jan 25, 2012
Accession Number
ADA582249

Entities

People

  • Andrew Homyk
  • Antti Saeynaetjoki
  • Ari Tervonen
  • Joshua R Hendrickson
  • Lasse Karvonen
  • Michael Gehl
  • Ricky Gibson
  • Sander Zandbergen
  • Seppo Honkanen
  • Tapani Alasaarela

Organizations

  • Air Force Research Laboratory

Tags

DTIC Thesaurus Topics

  • Coatings
  • Department Of Defense
  • Dielectrics
  • Electrical Engineering
  • Electron Beam Lithography
  • Electron Beams
  • Engineering
  • Fabrication
  • Films
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Photonic Crystals
  • Scattering
  • Surface Roughness
  • Thin Films

Fields of Study

  • Physics

Readers

  • Mathematics or Statistics
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Thin Film Deposition Science.