Microhollow Cathode Plasmas for Low Temperature, Ambient Diamond Growth

Abstract

SRI International (SRI) has conducted a detailed study of localized hydrocarbon/hydrogen plasmas for the purpose of depositing diamond thin films near atmospheric pressure and at low temperature. A microhollow cathode device was utilized to generate localized plasmas which were characterized spectroscopically. In addition, the electron density of these plasmas was predicted through computer generated simulations.

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Document Details

Document Type
Technical Report
Publication Date
Sep 09, 2011
Accession Number
ADA585453

Entities

People

  • Christine Cuppoletti

Organizations

  • SRI International

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Barometric Pressure
  • Contracts
  • Diamond Films
  • Electron Density
  • Electrons
  • Emission
  • Emission Spectra
  • Films
  • Free Electrons
  • Low Temperature
  • Materials
  • Materials Science
  • Measurement
  • Plasmonic Lasers
  • Simulations
  • Spectra
  • Thin Films

Readers

  • East Asian Political and Security Studies within the Soviet Union
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene