New PVD Technologies for New Ordnance Coatings

Abstract

This report summarizes a two-year effort on an EQBRD project. The objective was to research and develop new plasma enhanced physical vapor deposition technologies for deposition of pollution-free coatings for protection of armament components to extend cycle life. In this paper, technology research and development included: 1) Physical Vapor Deposition processes including plasma enhanced magnetron with external ion source, High Power Impulse Magnetron Sputtering (HIPIMS), and Modulated Pulsed Power (MPP); 2) Innovations of the HIPIMS and MPP processes based on the physics of Ionized Physical Vapor Deposition; 3) The plasma ion and mass characteristics using a Tantalum and a Chrome target; 4) Deposition of Ta coatings and reactive deposition of CrN; 5) Deposition parameters affecting film nucleation and growth properties; 6) Coatings characterization.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 2012
Accession Number
ADA588202

Entities

People

  • D. R. Schmidt
  • F. Yee
  • Jian Lin
  • M. Cipollo
  • M. Todaro
  • R. Chistyakov
  • R. Wei
  • S. L. Lee

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Biomedical
  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Coatings
  • Corrosion Resistance
  • Electron Emission
  • Electroplating
  • Erosion
  • High Temperature
  • Ion Sources
  • Materials
  • Measurement
  • Metals
  • Physical Vapor Deposition
  • Power
  • Pulsed Power
  • Sputtering
  • Vapor Deposition
  • Waveforms
  • Weapons

Readers

  • Defense Technology Research and Development.
  • Thin Film Deposition Science.