Structural and Optical Properties of Thick Freestanding AlN Films Prepared by Hydride Vapor Phase Epitaxy

Abstract

The morphology, structural and optical properties of void-assisted freestanding HVPE-AlN films were investigated by a combination of non-destructive microscopic and spectroscopic techniques. The freestanding approximately 80 mm thick clear film has a wurtzite crystalline structure with remarkable properties around the central film region. The E2(high)-phonon frequency coincides with reported stress-free film phonon frequency. The low temperature luminescence study of the growth and interface sides of the film is consistent with the incorporation of a high concentration of oxygen impurities. These results are promising as the growth method amenable to the production of freestanding stress-free large area substrates for epitaxial growth.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2012
Accession Number
ADA591474

Entities

People

  • A. Koukitu
  • J. A. Freitas Jr.
  • James C. Culbertson
  • Michael A. Mastro
  • Y. Kumagai

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Boundaries
  • Crystal Growth
  • Crystal Lattice Vibrations
  • Crystal Structure
  • Crystals
  • Diffraction
  • Epitaxial Growth
  • Films
  • Impurities
  • Lasers
  • Low Temperature
  • Measurement
  • Optical Properties
  • Raman Scattering
  • Scattering
  • Sense And Avoid Systems
  • Vapor Phases

Fields of Study

  • Materials science

Readers

  • Thin Film Deposition Science.