Leveraging Crystal Anisotropy for Deterministic Growth of InAs Quantum Dots with Narrow Optical Linewidths

Abstract

Crystal growth anisotropy in molecular beam epitaxy usually prevents deterministic nucleation of individual quantum dots when a thick GaAs buffer is grown over a nanopatterned substrate. Here, we demonstrate how this anisotropy can actually be used to mold nucleation sites for single dots on a much thicker buffer than has been achieved by conventional techniques. This approach greatly suppresses the problem of defect-induced line broadening for single quantum dots in a charge-tunable device, giving state-of-the-art optical linewidths for a system widely studied as a spin qubit for quantum information.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Aug 29, 2013
Accession Number
ADA591547

Entities

People

  • Allan S. Bracker
  • Chul S. Kim
  • Doewon Park
  • Lily Yang
  • Michael K. Yakes
  • Mijin Kim
  • Patrick M Vora
  • Peter G Brereton
  • Samuel G Carter
  • Timothy M. Sweeney

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Anisotropy
  • Chemical Vapor Deposition
  • Crystals
  • Electron Beam Lithography
  • Electron Beams
  • Epitaxial Growth
  • Fabrication
  • Heterojunctions
  • High Density
  • Hydrogen
  • Military Research
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Nucleation
  • Oxides
  • Quantum Dots
  • United States

Fields of Study

  • Physics

Readers

  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Quantum Computing
  • Quantum Science - Quantum Dots