Spoof-Like Plasmonic Behavior of Plasma Enhanced Atomic Layer Deposition Grown Ag Thin Films

Abstract

The plasmonic behavior of Ag thin films produced by plasma enhanced atomic layer deposition (PEALD) has been investigated. We show that as-deposited flat PEALD Ag films exhibit unexpected plasmonic properties, and the plasmonic enhancement can differ markedly, depending on the microstructure of the Ag film. Electromagnetic field simulations indicate that this plasmonic behavior is due to air gaps that are an inherent property of the mosaic-like microstructure of the PEALD-grown Ag film, suggesting that this is a metamaterial with behavior very similar to what would be expected in spoof plasmonics where gaps are fabricated in films to create plasmonic-like resonances.

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Document Details

Document Type
Technical Report
Publication Date
Jan 30, 2012
Accession Number
ADA595711

Entities

People

  • Edward E. Foos
  • Erin Cleveland
  • Jaakko Niinistoe
  • Josh D. Caldwell
  • Mikko Ritala
  • O. J. Glembocki
  • Sharka M. Prokes

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Gaps
  • Chemistry
  • Electric Fields
  • Electromagnetic Fields
  • Electron Microscopes
  • Films
  • Geometry
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Metallic Nanoparticles
  • Metamaterials
  • Microstructure
  • Nanoparticles
  • Simulations
  • Thin Films
  • Two Dimensional

Fields of Study

  • Physics

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene