BST Films Grown by Metal Organic Chemical Vapor Deposition Incorporating Real-Time Control of Stoichiometry

Abstract

We present preliminary results of metal organic chemical vapor deposition (MOCVD) growth of BaxSr1-xTiO3 (BST) thin films. Films were deposited on MgO, sapphire, Si, and Si/Pt/Ti substrates. Real-time monitoring of the precursor flux by UV absorption spectroscopy was used to control the composition of the films over the range 30 </= x </= 80. The films were characterized for a number of attributes including composition, crystalline structure, and morphology.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2009
Accession Number
ADA596338

Entities

People

  • C. Hubbard
  • David A. Boyd
  • Melanie W. Cole
  • S. G. Hirsch

Organizations

  • United States Army Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Weapons Technologies

DTIC Thesaurus Topics

  • Absorption
  • Chemical Kinetics
  • Chemical Vapor Deposition
  • Control Systems
  • Curie Temperature
  • Electrical Properties
  • Films
  • Flow Rate
  • Mass Flow
  • Materials
  • Measurement
  • Metals
  • Military Research
  • Spectra
  • Thin Films
  • Vapor Deposition
  • Vapor Pressure

Fields of Study

  • Materials science

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