Transparent Oxide TFTs Fabricated by Atomic Layer Deposition

Abstract

To realize the high performance and reliable ZnO thin films transistors, we focused on atomic layer deposition. Previously we have established basic process condition for fabrication of ZnO film and thin film transistors. In this study, we will develop higher quality thin film and higher performance thin film transistors by using atomic layer deposition.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Apr 17, 2014
Accession Number
ADA602349

Entities

People

  • Yukiharu Uraoka

Organizations

  • Nara Institute of Science and Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Dielectrics
  • Electrical Properties
  • Fabrication
  • Films
  • Flat Panel Displays
  • High Pressure
  • Low Temperature
  • Mass Production
  • Mass Spectrometry
  • Materials
  • Measurement
  • Physical Properties
  • Semiconductors
  • Thin Film Transistors
  • Thin Films
  • Transistors

Readers

  • Integrated Circuit Design and Technology.
  • Thin Film Deposition Science.