Development of Antimicrobial Coatings by Atmospheric Pressure Plasma Using a Guanidine-Based Precursor
Abstract
Antimicrobial coatings deposited onto ultra high molecular weight polyethylene (UHMWPE) films were investigated using an atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD) process. Varying concentrations of a guanidine-based liquid precursor, 1,1,3,3-tetramethylguanidine, were used, and different deposition conditions were studied. Attenuated total reflectance Fourier Transform Infrared (ATR-FTIR) spectroscopy and X-ray Photoelectron Spectroscopy (XPS) were used to study the chemical structure and elemental composition of the coatings. Conformity, morphology, and coating thickness were assessed through SEM and AFM. Optimal AP-PECVD parameters were chosen and applied to deposit guanidine coatings onto woven fabrics. The coatings exhibited high antimicrobial activity against Escherichia coli (E. coli) and Staphylococcus aureus (S. aureus) based on a modified-AATCC 100 test standard, where 2 5 log reductions were achieved.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 29, 2013
- Accession Number
- ADA608004
Entities
People
- Andre A. Williams
- Daphne D. Pappas
- Jacqueline H. Yim
- Julia L. Leadore
- Lars T. Piehler
- Michelle S. Fleischman
- Victor Rodriguez-santiago
Organizations
- United States Army Research Laboratory