Characterization of One-Dimensional Quantum Channels in InAs/AlSb

Abstract

We report on the magnetoresistance characteristics of one-dimensional electrons confined in a single InAs quantum well sandwiched between AlSb barriers. As a result of a nanofabrication scheme that utilizes a 3-nm-shallow wet chemical etching to define the electrostatic lateral confinement, the system is found to possess three important properties: specular boundary scattering, a strong lateral confinement potential, and a conducting channel width that is approximately the lithography width. Ballistic transport phenomena, including the quenching of the Hall resistance, the last Hall plateau, and a strong negative bend resistance, are observed at 4 K in cross junctions with sharp corners. In a ring geometry, we have observed Aharonov-Bohm interference that exhibits characteristics different from those of the GaAs counterpart due to the ballistic nature of electron transport and the narrowness of the conducting channel width.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Sep 06, 2002
Accession Number
ADA608396

Entities

People

  • Henry Yang
  • James C. Culbertson
  • K. A. Cheng
  • M. J. Yang

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Electron Beam Lithography
  • Electron Beams
  • Electrons
  • Energy Bands
  • Fabrication
  • Fermi Levels
  • Geometry
  • Heterojunctions
  • High Electron Mobility Transistors
  • Magnetic Fields
  • Materials
  • Mean Free Path
  • Quantum Wells
  • Quantum Wires
  • Scattering
  • Semiconductors
  • Two Dimensional

Fields of Study

  • Materials science

Readers

  • Electromagnetic Wave Scattering and Antenna Radiation Engineering
  • Nanofabrication and Microfabrication.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing