Investigation of Impurities in type-II InAs/GaSb Superlattices via Capacitance-Voltage Measurement
Abstract
Capacitance-voltage measurement was utilized to characterize impurities in the non-intentionally doped region of Type-II InAs/GaSb superlattice p-i-n photodiodes. Ionized carrier concentration versus temperature dependence revealed the presence of a kind of defects with activation energy below 6meV and a total concentration of low 1015 cm 3. Correlation between defect characteristics and superlattice designs was studied. The defects exhibited a p-type behavior with decreasing activation energy as the InAs thickness increased from 7 to 11 monolayers, while maintaining the GaSb thickness of 7 monolayers. With 13 monolayers of InAs, the superlattice became n-type and the activation energy deviated from the p-type trend.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 17, 2013
- Accession Number
- ADA608439
Entities
People
- A. M. Hoang
- Abbas Haddadi
- Bang Le-Huy Nguyen
- Genyu Chen
- M. Razeghi
- P. R. Bijjam
- S. Bogdanov
Organizations
- Northwestern University