Dispersion Engineering of High-Q Silicon Microresonators via Thermal Oxidation - Postprint
Abstract
We propose and demonstrate a convenient and sensitive technique for precise engineering of group-velocity dispersion in high-Q silicon microresonators. By accurately controlling the surface-oxidation thickness of silicon microdisk resonators, we are able to precisely manage the zero-dispersion wavelength, while simultaneously further improving the high optical quality of our devices, with the optical Q close to a million. The demonstrated dispersion management allows us to achieve parametric generation with precisely engineerable emission wavelengths, which shows great potential for application in integrated silicon nonlinear and quantum photonics.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 12, 2014
- Accession Number
- ADA614180
Entities
People
- Jidong Zhang
- Nicholas G. Usechak
- Qiang Lin
- Wei C. Jiang
Organizations
- Air Force Research Laboratory