Development and Verification of Sputtered Thin-Film Nickel-Titanium (NiTi) Shape Memory Alloy (SMA)

Abstract

This report details the development of a co-sputtering process to yield a shape memory alloy (SMA) film with a controllable composition of nickel-titanium (Ni50Ti50) and transformation temperature around 60 C. Shape memory effects were characterized using differential scanning calorimetry (DSC), for which we demonstrated martensite-austenite phase change at 57 C for 1 3 m films annealed at 600 C for 1 h. We used wafer stress versus temperature measurements as additional confirmation for the repeatable measurement of reversible phase transformation peaking at 73 C upon heating. Up to 62 MPa was available for actuation during the thermally induced phase change. Future work will involve fabricating functional microelectromechanical system (MEMS) devices (i.e., cantilevers, actuators, etc.) based on our Ni50Ti50 SMA.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 2015
Accession Number
ADA621260

Entities

People

  • Christopher J. Morris
  • Cory R. Knick

Organizations

  • United States Army Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Actuators
  • Alloys
  • Austenite
  • Calorimetry
  • Electron Microscopes
  • Films
  • Martensite
  • Materials
  • Measurement
  • Microelectromechanical Systems
  • Phase Transformations
  • Residual Stress
  • Scanning
  • Shape Memory Alloys
  • Sputtering
  • Thin Films
  • Titanium

Fields of Study

  • Materials science

Readers

  • Marine Propulsion Engineering and Naval Architecture
  • Powder metallurgy of Titanium alloys.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems