Applying LaPO4 Phosphor via Spinning for BetaPhotovoltaic Devices
Abstract
The semiconductor fabrication technique of spinning photoresist was modified and applied to the problem of creating a uniform coating of phosphor on a betaphotovoltaic (BPV) device. A mixture of phosphor was applied to 3 samples (Si, GaN, and a GaN die with devices fabricated on its surface), and all 3 samples were spun at various speeds using a spinner. A uniform coating of phosphor was not achieved for 2 reasons: the phosphor does not fully dissolve in water, and the phosphor mixture does not stick well to the samples.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 2015
- Accession Number
- ADA621659
Entities
People
- Joshua R. Smith
- Kenneth A. Jones
- Kevin Kirchner
- Muhammad R. Khan
Organizations
- United States Army Research Laboratory