The Influence of Growth Temperature on Sb Incorporation in InAsSb, and the Temperature-dependent Impact of Bi Surfactants

Abstract

A series of two-layer InAsSb films were grown with molecular beam epitaxy (MBE). We report the effect of substrate temperature on the compositio of InAsSb grown with and without a Bi surfactant and fid that the Sb incroporation is suppressed as the substrate temperatutre increases, and that it is also further suppressed by the presence of Bi at all temperatures. We examine the data with a kinetic model, which gives insights into the composition of mixed anion alloys using straightforward rate equations for each process that occurs during growth. It was shown that the reduction in Sb compositin is due to the preferential removal of Bi by As, and that removal rate obeys an Arrhenius dependence with an activation energy of 1.35 eV.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2014
Accession Number
ADA622563

Entities

People

  • A. M. Lundquist
  • C. Pearson
  • E. M. Anderson
  • J. M. Millunchick
  • Stefan P. Svensson
  • Wendy L. Sarney

Organizations

  • University of Michigan

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemistry
  • Crystal Growth
  • Crystals
  • Energy
  • Engineering
  • Equations
  • Heat Of Activation
  • Materials
  • Materials Science
  • Military Research
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Physics
  • Semiconductors
  • Solid State Physics
  • Substrates
  • Universities

Fields of Study

  • Materials science

Readers

  • Analytical Mechanics
  • Combustion science or combustion engineering.
  • Semiconductor Device Technology