An Extended Defect as a Sensor for Free Carrier Diffusion in a Semiconductor
Abstract
We use confocal photoluminescence microscopy to study carrier diffusion near an isolated extended defect (ED) in GaAs. We observe that the carrier diffusion length varies nonmonotonically with carrier density, which we attribute to competition between point defects and the extended defect. High density laser illumination induces a permanent change in the structure of the extended defect, more significantly an apparent change in the effective polarity of the defect, and thus a drastic change in its range of influence. The inferred switch of principal diffusing species leads to a potential design consideration for high injection optoelectronic devices.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 11, 2013
- Accession Number
- ADA626148
Entities
People
- M. W. Wanlass
- T. H. Gfroerer
- Yong Zhang
Organizations
- University of North Carolina at Charlotte