On the Significance of a Carbon-Rich Background in Plasma-Based Graphene Oxide Reduction

Abstract

The reduction of oxygen concentration in graphene oxide is demonstrated using electron beam generated plasmas produced in three different gas backgrounds: Ar, Ar/H2 and Ar/CH4. Plasma diagnostics and surface characterizations are combined to determine the influence of each working gas on the chemical composition and structure of graphene oxide before and after reduction. The results suggest that argon treatment alone allows the removal of weakly bound oxygen in graphene oxide by inert ion bombardment, while the addition of hydrogen adds reactive species that enhance the removal of oxygen. However, without a carbon source, removing oxygen from graphene oxide can lead to the formation of defects and vacancies. We find that methane provides not only hydrogen but also the carbon necessary to restore the graphitic plane by healing defects generated during reduction.

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Document Details

Document Type
Technical Report
Publication Date
Jun 02, 2016
Accession Number
ADA635076

Entities

People

  • David R. Boris
  • M. Baraket
  • P. E. Sheehan
  • Scott G. Walton
  • Zhongxiang Wei

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Charged Particles
  • Chemical Engineering
  • Chemistry
  • Electron Beams
  • Electron Density
  • Electron Energy
  • Electrons
  • Films
  • Materials
  • Materials Processing
  • Materials Science
  • Measurement
  • Particle Physics
  • Raman Spectroscopy
  • Spectra
  • Spectroscopy
  • Surface Energy

Fields of Study

  • Physics

Readers

  • Nanocomposite Materials Science
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Microelectronics
  • Microelectronics - Graphene