Atomic Oxygen (AO) and Nitrogen (AN) In-situ Flux Sensor
Abstract
Molecular beam epitaxy (MBE) of oxides and nitrides has emerged in the past two decades as an important application of the powerful MBE synthesis approach, with its ability to achieve controlled layer-by-layer growth on the atomic level. In the case of oxides and nitrides, one problem has been the lack of actively controlled in-situ sources of atomic oxygen and nitrogen suitable for MBE application. (Full Report attached)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 10, 2016
- Accession Number
- ADA637439
Entities
People
- Malcolm Beasley
Organizations
- Stanford University