Thyratron Modulators in Plasma Source Ion Implantation Magnetized

Abstract

Plasma Source Ion Implantation (PSII) is an emerging technology which can be used to harden metal surfaces in a conformal manner. North Star Research Corp. (NSRC) is building a unique implanter system for Empire Hard Chrome which will be the first truly commercial implanter of this type. The choice of pulsed power technology for this application is important from the standpoint of both reliability and compatibility with the basic plasma processes under consideration. In this paper, we will evaluate the various possible pulsed power system choices including thyratron modulators, hard tube modulators, and crossatron modulators in the context of compatibility with the plasma and implantation process. Currents in the hundreds of amperes at 80- 100 kV are clearly found to be desirable based on the requirements of the process. This leads to the logical choice of thyratron/transformer modulators at lower average powers, or Crossatron modulators at higher average powers. We also discuss PFN design for thyratron modulators for the universal PSII-type waveform. A thyratron modulator was selected for the Empire implanter due to the requirements for low cost and high peak current.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1995
Accession Number
ADA639544

Entities

People

  • Jacob Scheuer
  • R. J. Adler
  • W. Horne

Organizations

  • Los Alamos National Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Capacitors
  • Clipper Circuits
  • Energy
  • High Voltage
  • Implantation
  • Ion Implantation
  • Ion Sources
  • Ions
  • Modulators
  • Power
  • Pulse Transformers
  • Pulsed Power
  • Sputtering
  • Thyratrons
  • Transformers
  • Voltage
  • Waveforms

Fields of Study

  • Physics

Readers

  • Electrical Engineering
  • Surface Engineering/Surface Coating Technology.
  • Systems Analysis and Design