Pulsed X-Ray Lithography.
Abstract
A method and means for x-ray lithography which utilizes means for producing in a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material (gold) of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 keV, there is little if any substrate damage due to the x-rays. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 15, 1978
- Accession Number
- ADD005292
Entities
People
- David J. Nagel
- Martin C. Peckerar
Organizations
- United States Department of the Navy