Band Interacting Tunnel Heterojunctions.
Abstract
A bilateral tunnel device having a voltage dependent transfer coefficient is disclosed which includes a heterostructure consisting of a first layer of GaSb(1-y)AS(y,) a second layer of In(1-x)Ga(x)As, and a third layer of GaSb(1-7)As(7). The thicknesses of the first and third layers are not critical but the thickness of the second layer must be less than 200 angstroms thick. It is also disclosed that other alloys of Group III and Group V materials can be employed in a tunnel device of the instant invention. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 29, 1979
- Accession Number
- ADD005926
Entities
People
- G. A. Sai-halasz
- L. Esaki
Organizations
- United States Department of the Army