Method of Chemically Polishing a Doubly Rotated Quartz Plate.
Abstract
The general object of this invention is to provide a method of chemically polishing a doubly rotated quartz plate. A more particular object of the invention is to provide such a method that will chemically polish a doubly rotated quartz plate whose theta angle is between about 33 deg and 36 deg and whose phi angle is between about 10 deg and 26 deg. A particular object of the invention is to provide a method of chemically polishing an SC-cut doubly rotated quartz plate. Another object of the invention is to provide a method of making quartz plates of great strength suitable for high shock resonator applications. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 08, 1980
- Accession Number
- ADD007596
Entities
People
- John R. Vig
- Ronald J. Brandmayr
Organizations
- United States Army