Band Interacting Tunnel Heterojunction.
Abstract
A bilateral tunnel device having a voltage dependent transfer coefficient is disclosed which includes a heterostructure consisting of a first layer of GaSb sub 1-yAS sub y, a second layer of In sub 1-xGA sub xAS, and a third layer of GASb sub 1-yAS sub y. The thicknesses of the first and third layers are not critical but the thickness of the second layer must be less than 200 angstroms thick. It is also disclosed that other alloys of Group III and Group V materials can be employed in a tunnel device of the instant invention.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 09, 1981
- Accession Number
- ADD008180
Entities
People
- George A. Sai-halasz
- Leo Esaki
Organizations
- United States Army