Method of Vacuum Depositing Metallic and Nonmetallic Coating Onto a Substrate.

Abstract

Metallic and non metallic coatings are vacuum deposited onto a substrate using different deposition methods in a single vacuum deposition chamber without breaking vacuum between depositions. The deposition methods are RF sputter, electron beam gun evaporation, and chemical vapor deposition. The method allows for a multiple deposition of a large number of distinct and special coatings on various substrates to be accomplished without exposing the sensitive coatings to atmospheric poisoning. (Author)

Document Details

Document Type
Technical Report
Publication Date
Oct 26, 1981
Accession Number
ADD008986

Entities

People

  • Edward Daly
  • Louis E. Branovich
  • Stanley Dubuske
  • Willis M. Smith

Organizations

  • United States Army

Tags

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Coatings
  • Deposition (Materials Processing)
  • Electron Beams
  • Electrons
  • Evaporation
  • Material Coating Processes
  • Materials Processing
  • Poisoning
  • Substrates
  • Vacuum Deposition
  • Vapor Deposition
  • Vapors

Fields of Study

  • Physics

Readers

  • Plasma Physics.
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene