Process for Developing a Negative Electron Resist.

Abstract

A method of developing a negative electron resist for delineating a desired integrated circuit pattern upon a circuit substrate is disclosed for a negative resist consisting of a copolymer film of (poly(glycidyl methacrylate-co-styrene)) using a mixture of 1:1 chlorobenzene and 2- propanol as the developer. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jun 16, 1982
Accession Number
ADD009523

Entities

People

  • Juey H. Lai

Organizations

  • United States Army

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Chemical Compounds
  • Chlorobenzene
  • Circuits
  • Copolymers
  • Electrons
  • Integrated Circuits
  • Methacrylates
  • Organic Compounds
  • Propanols
  • Substrates

Readers

  • Nanofabrication and Microfabrication.
  • Organic Chemistry

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene