InP:Te Protective Layer for Reducing Substrate Dissociation.
Abstract
In order to prevent the formation of indium droplets upon the surface of an indium phosphide wafer during liquid phase epitaxial growth, a doped protective layer is deposited by LPE upon said substrate before epitaxial growth of additional layers occurs. The doped protective layer is composed of indium phosphide doped with tellerium to a concentration of about high 10 to the 18th power to low 10 to the 19th power.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 25, 1982
- Accession Number
- ADD009636
Entities
People
- Frank Z. Hawrylo
Organizations
- United States Department of the Air Force