Chemical Vapor Deposition and Reactive Diffusion of Boron on Beryllium.
Abstract
This abstract discloses a method for depositing boron on a beryllium substrate by using chemical vapor deposition. The method involves treating the surface of a heated beryllium substrate with a mixture of argon and diborane. The substrate is rotated during the chemical vapor deposition for the formation of beryllium boride layer of uniform thickness. The CVD gas mixture is adjusted for improved bonding of the beryllium boride to the substrate and thus improved wear resistance and reduced friction characteristics of the beryllium substrate.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 27, 1983
- Accession Number
- ADD011043
Entities
People
- Debabrata Das
- K. Kumar
Organizations
- United States Department of the Navy