Quantum Well Electron Barrier Diode.

Abstract

This patent application relates to electron barrier diodes, and more particularly, to an asymmetric quantum well electron barrier diode. A quantum well electron barrier diode is described which comprises a substrate, a first buffer layer on the substrate, a superlattice structure on the first buffer layer, a second buffer layer on the superlattice structure, a contacting layer on the second buffer layer and first and second ohmic contacts attached to the contacting layer and substrate respectively. The superlattice structure comprises a sequence of a plurality of high energy gap barrier layers interleaved with a plurality of low energy gap wells. The sequence is repeated until the desired thickness is reached. Current flows perpendicular to the layers.

Document Details

Document Type
Technical Report
Publication Date
Mar 13, 1986
Accession Number
ADD012432

Entities

People

  • Steven W. Kirchoefer

Organizations

  • United States Department of the Navy

Tags

DTIC Thesaurus Topics

  • Electrons
  • Energy
  • Energy Gaps
  • High Energy
  • Metal-Semiconductor Junctions
  • Patent Applications
  • Patents
  • Quantum Wells
  • Sequences
  • Substrates
  • Superlattices
  • Thickness

Fields of Study

  • Materials science

Readers

  • Electrical Engineering
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Quantum Computing