Radiation Hardening of MOSFET (Metal-Oxide-Semiconductor Field-Effect Device).

Abstract

A MOSFET device which typically utilizes silicon dioxide as an insulating material and which becomes inoperative under ionizing radiation conditions can be made to significantly enhance its radiation survivability by introducing crystalline zinc sulfide as an insulating material. The invention may be manufactured as one of three variations. Crystalline zinc sulfide may replace silicon dioxide as the gate insulator, the field insulator, or both the gate and field insulators.

Document Details

Document Type
Technical Report
Publication Date
Feb 24, 1983
Accession Number
ADD013766

Entities

People

  • Mark R. Ackermann

Organizations

  • United States Department of the Air Force

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Dielectrics
  • Dioxides
  • Films
  • Hardening
  • Ionizing Radiation
  • Materials
  • Metal Oxide Semiconductors
  • Metal Oxides
  • Oxides
  • Radiation
  • Radiation Hardening
  • Semiconductors
  • Silicon
  • Silicon Carbide
  • Silicon Dioxide

Readers

  • Electrical Engineering
  • Nuclear and Radiation Engineering.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene