Volatile Divalent Metal Alkoxides.
Abstract
This invention relates to volatile divalent metal alkoxides useful for the CVD deposition of metal oxides to a substrate. More particularly, this invention relates to volatile alkoxides of barium, strontium, or calcium used to deposit oxides used to make thin, superconducting copper oxide films. The precursors have the formula M (OR)2, wherein M is selected from the group consisting of Barium, Calcium, and Strontium, and R is selected from the group consisting of unsubstituted alkyl groups of 6 to 13 carbons and halogen substituted alkyl groups of 3 to 4 carbons wherein the halogen is selected from two of the halogen substitutions are fluorine. The secondary or tertiary alkyl groups are preferred and the tertiary alkyl groups are most preferred. Keywords: Chemical vapor deposition, Patent applications. (aw)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 31, 1989
- Accession Number
- ADD014208
Entities
People
- Alan Berry
- Andrew P Purdy
Organizations
- United States Department of the Navy