Organometallic Antimony Compounds Useful in Chemical Vapor Deposition Processes.
Abstract
The invention relates to organometallic antimony compounds and their halide derivatives which are useful as sources or precursors for sources in chemical vapor deposition (CVD) processes such as those employed in the fabrication of semiconductors. Organometallic antimony compounds having increased stability that are useful in chemical vapor deposition processes are provided which comprise stibines containing sterically-demanding ligands, stibines lacking beta hydrogen atoms, or aromatic stibines. These compounds will generally have the formula wherin R is selected from the group consisting of neopentyl, 2-ethylbutyl, 1-ethylpropyl, perhaloalkanes having 3-5 carbon atoms, benzyl, fluoro-substituted phenyl, cyclopentyl, and pentamethylcyclopentadienyl; X is selected from the group consisting of Br, Cl, I and H; and wherein n is an integer from 1 to 3. These compounds exhibit increased thermal stability and are thus advantageously used as substitutes for arsenic or other group V metals in chemical vapor deposition processes. Because of the bulky ligand group bound to the antimony and/or the lack of beta hydrogen atoms in the ligand, these organometallic stibines are less prone to decompose prematurely and thus exhibit greater thermal stability than previously known alkyl antimony hydride compounds. Patent applications. (AW)
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 29, 1989
- Accession Number
- ADD014428
Entities
People
- John C. Pazik
Organizations
- United States Department of the Navy