Formation of High T(c) Superconducting Films by Organometallic Chemical Vapor Deposition.
Abstract
This invention relates to a method of forming high Tc superconducting films by organometallic chemical vapor deposition. More specifically, this invention relates to a method of forming superconducting films on a semiconductor surface by chemical vapor deposition of volatile organometallic compounds of the rare earth and alkaline earth elements, and copper. Keywords: Reports, Periodicals, Military publications, Scientific literature. (eg)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 16, 1989
- Accession Number
- ADD014498
Entities
People
- Alan Berry
- D. Kurt Gaskill
- Edward Cukauskas
- Ronald Holm
Organizations
- United States Department of the Navy