High Temperature Substrate Mount for Chemical Vapor Deposition of Diamond.

Abstract

This patent application discloses an apparatus for chemical vapor deposition of diamond on a substrate seed crystal held by vacuum suction on a mount while chemical vapor deposition of diamond is carried out on the substrate seed crystal.

Document Details

Document Type
Technical Report
Publication Date
Sep 30, 1992
Accession Number
ADD015563

Entities

People

  • J. E. Butler
  • K. Doversprike

Organizations

  • United States Department of the Navy

Tags

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Deposition (Materials Processing)
  • High Temperature
  • Patent Applications
  • Patents
  • Substrates
  • Vapor Deposition

Fields of Study

  • Chemistry
  • Materials science

Readers

  • Electrical Engineering
  • Semiconductor Device Technology