Substrate Temperature Control Apparatus and Technique for CVD Reactors.

Abstract

One of the critical experimental parameters affecting the quality and growth rate of chemical vapor deposition species, such as, diamond is the substrate temperature. An apparatus and technique for the precise control of the substrate temperature in a chemical vapor deposition environment has been developed. In a preferred embodiment, the technique uses a variable gas mixture in conjunction with the disclosed apparatus of the present invention to precisely control the temperature of the substrate to within at least +/- 20 deg C for extended periods of time and over large area substrates on the order of 1 in diameter or larger

Document Details

Document Type
Technical Report
Publication Date
May 18, 1993
Accession Number
ADD015818

Entities

People

  • Thomas A. Snail
  • Thomas P. Thorpe

Organizations

  • United States Department of the Navy

Tags

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Deposition (Materials Processing)
  • Diameters
  • Environment
  • Inventions
  • Material Coating Processes
  • Materials Processing
  • Substrates
  • Temperature Control
  • Vapor Deposition

Readers

  • Computational Modeling and Simulation
  • Electrical Engineering
  • Thin Film Deposition Science.