Selective Vapor Deposition Using Films Cross-Reference to Related Application.
Abstract
The present invention is directed to the selective and non-selective vapor deposition of materials upon substrates. Vapor deposition is accomplished by providing a substrate having one or more chemical groups on its surface, the chemical groups being capable of bonding to a deposition catalyst, contacting a deposition catalyst to the chemical groups of the substrate and vapor depositing a material upon the catalyst via vapor deposition. The vapor deposition may also be selective vapor deposition. jg p.49
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 04, 1995
- Accession Number
- ADD017650
Entities
People
- David S. Hsu
- Jeffrey M. Calvert
- Pehr E. Pehrsson
- Stephen J. Potochnik
Organizations
- United States Department of the Navy