In-Situ Monitoring and Feedback Control of Metalorganic Precursor Delivery.
Abstract
The in-situ monitoring of metalorganic precursor delivery in a metalorganic chemical vapor deposition oxide system in high temperature super conductors (HTSC) film growth is accomplished by utilizing the distinct absorbance bands for metalorganic compounds. As an ultraviolet-visible light beam is passed through an effluent metalorganic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metalorganic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 06, 1995
- Accession Number
- ADD018186
Entities
People
- Brian Rappoli
- William J. Desisto
Organizations
- United States Department of the Navy