Large Area Plasma Processing System (LAPPS).
Abstract
The large area plasma processing system (LAPPS) is a system wherein an electron beam is used to produce a plasma. A large area uniform plasma is produced where length and width can be comparable (10's-100's of cm) and very much larger than the plasma thickness (approx. 1 cm). The plasma distribution is created independent of the surface to be processed and the bias applied to the surface. The beam-produced plasma has a low intrinsic electron and excitation temperature plasma, allowing the process to be conducted with better control of free radical production. A material, such as a substrate, being processed may be placed in close proximity to plasma with controlled ion bombardment or without substantial bombardment by energetic ions. The system also offers a large available area for gas inflow and removal from the processing chamber and cathode chamber so as not to contaminate the material being processed or damage the cathode.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 27, 1997
- Accession Number
- ADD018627
Entities
People
- Mártin Lampe
- Richard F. Fernsler
- Robert A. Meger
- Wallace M. Manheimer
Organizations
- Office of Naval Research