Electronic Devices Grown on Off-Axis Sapphire Substrate
Abstract
An electronic device characterized by a 10-300 micron thick sapphire crystal substrate having a polished off alpha-plane growth surface, a 10-1000 angstrom thick nucleating layer disposed on the substrate for promoting film growth thereon, and a 0.1 - 10 micron thick semiconducting film disposed on the nucleating layer.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 15, 1999
- Accession Number
- ADD019445
Entities
People
- A. E. Wickenden
- Daniel Koleske
- M. E. Twigg
- Mohammad Fatemi
- Richard Henry
Organizations
- United States Department of the Navy