Ion-Induced Reactions in Thin Film Structures of Al and Near-Noble Metals,
Abstract
Thin film Pd/Al, Ni/Al and Pt/Al interdigitated samples, either thermally reacted to form intermetallic compounds or left in their unreacted state, were irradiated with Xe ions to doses of 2 x 10 to the 14th power to 2 x 10 to the 15th power Xe ions/squared cm. Only crystalline compounds of the simplest structure, cP2 could be identified by electron diffraction. Compounds of a more complex structure than cP2 decompose upon irradiation into an amorphous mixture and elemental constituents. Table 1 presents a summary of the results found in all three metal/Al systems. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1983
- Accession Number
- ADP001658
Entities
People
- J. W. Mayer
- L. S. Hung
- Mike Nastasi
Organizations
- Cornell University